Artikel
Antimicrobial effect of thin Titanium-Copper films on implant surfaces
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Autoren
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H. Rebl
- Rostock University Medical Center, Dept. of Cell Biology, Rostock, Germany
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H. Wulff
- University of Greifswald, Institute of Physics, Greifswald, Germany
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C. Zietz
- Rostock University Medical Center, Dept. of Orthopaedics, Rostock, Germany
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K. Arndt
- Rostock University Medical Center, Dept. of Medical Microbiology, Virology and Hygiene, Rostock, Germany
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R. Bogdanowicz
- University of Greifswald, Institute of Physics, Greifswald, Germany
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B. Nebe
- Rostock University Medical Center, Dept. of Cell Biology, Rostock, Germany
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R. Bader
- Rostock University Medical Center, Dept. of Orthopaedics, Rostock, Germany
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A. Podbielski
- Rostock University Medical Center, Dept. of Medical Microbiology, Virology and Hygiene, Rostock, Germany
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Z. Hubicka
- Academy of Sciences of the Czech Republic, Institute of Physics, Prague, Czech Republic
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R. Hippler
- University of Greifswald, Institute of Physics, Greifswald, Germany
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V. Stranak
- University of South Bohemia, Faculty of Science, Ceske Budejovice, Czech Republic
| Veröffentlicht: | 30. September 2016 |
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Gliederung
Text
Implant infection followed by aseptic loosening is the most common reason for revision surgery [1]. Several metal ions (e.g. Cu2+, Ag+) are described as antimicrobial agents that can be deposited on implant surfaces. Among others, copper ions appear promising because of the good antibacterial effect while having relatively low cytotoxicity towards human body cells [2]. We used plasma assisted magnetron sputtering for the deposition of thin titanium-copper (Ti-Cu) films [3]. In particular, dual high-power impulse magnetron sputtering (dual-HiPIMS) technique was applied to generate surfaces that exert antimicrobial effects on Staphylococcus epidermidis bacteria (in biofilm and planktonic state) while not affecting the growth of human osteoblastic cells.
The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within the first 24 hours in cell culture medium the amount of Cu released from dual-HiPIMS films was about 250 µg (6 mmol/l in 700 µl, see Table 1 [Tab. 1]).
To test the antibacterial effectiveness S. epidermidis bacteria were seeded on the surfaces and the growth was observed over a period of 10 days to consider possibly occurring re-growth of persisting bacteria. On films prepared using the dual-HiPIMS technique both planktonic and biofilm bacteria were killed completely. No re-growth could be detected up to day 10. After the total release of copper from the Ti-Cu film the vitality of human osteoblastic cells increased significantly. An initial cytotoxic effect followed by the growth of osteoblastic cells was demonstrated.
We conclude that dual-HiPIMS is a promising technique for the deposition of thin Ti-Cu films exerting an antibacterial effect followed by satisfactory growth of human bone cells. This could be used in replacement surgery to reduce the risk of infection and to increase the acceptance of the revised implants.
References
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- 3.
- Stranak V, Wulff H, Rebl H, Zietz C, Arndt K, Bogdanowicz R, Nebe B, Bader R, Podbielski A, Hubicka Z, Hippler R. Deposition of Thin Titanium-Copper Films with Antimicrobial Effect by Advanced Magnetron Sputtering Methods. Mat Sci Eng C. 2011;31(7):1512-9. DOI: 10.1016/j.msec.2011.06.009
