Figure 6: Spatial release from masking (SRM) from S0N0 and S0N60 of the three measurement conditions: 1. free field, 2. RT 390 ms (80% absorption), and 3. RT 580 ms (60% absorption)
Figure 6: Spatial release from masking (SRM) from S0N0 and S0N60 of the three measurement conditions: 1. free field, 2. RT 390 ms (80% absorption), and 3. RT 580 ms (60% absorption)